ENEE416

Prerequisite: Minimum grade of C- in ENEE303; and must have earned a minimum grade of regular (letter) C- in all required 200-level ENEE courses; and permission of ENGR-Electrical & Computer Engineering department. Restriction: Must be in one of the following programs (Engineering: Computer; Engineering: Electrical). Formerly: ENEE419J. Characterization of wafers and fabrication steps. Oxide growth, lithography, dopant diffusion, and metal deposition and patterning will be discussed in the lectures and carried out in the lab in fabricating NMOS transistor circuits. The transistor characteristics will be measured and related to the fabrication parameters.